Silicide Tungsten

Tungsten silicide WSi2 waxaa loo isticmaalaa sida walxo koronto oo shil ah oo ku jira microelectronics, shunting fiilooyinka polysilicon, daahan anti-oxidation iyo daahan silig iska caabin ah.Silicidka Tungsten waxaa loo isticmaalaa sidii walxo xiriir ah oo ku jira microelectronics, oo leh iska caabin ah 60-80μΩcm.Waxa lagu sameeyay 1000°C.Caadi ahaan waxaa loo adeegsadaa sidii shunt loogu talagalay xadadka polysilicon si loo kordhiyo dhaqdhaqaaqa iyo kordhinta xawaaraha signalka.Lakabka siliciide tungsten waxaa lagu diyaarin karaa kaydka uumiga kiimikada, sida kaydinta uumiga.Isticmaal monosilane ama dichlorosilane iyo tungsten hexafluoride sida gaas cayriin ah.Filimka la shubay waa mid aan stoichiometric ahayn wuxuuna u baahan yahay xinjin si loogu beddelo qaab stoichiometric ah oo firfircoon.

Silicide Tungsten wuxuu bedeli karaa filimkii hore ee tungsten.Silicide Tungsten waxa kale oo loo isticmaalaa sidii lakabka xannibaadda ee u dhexeeya silikoon iyo biraha kale.

Silicide Tungsten wuxuu kaloo aad u qiimo badan yahay nidaamyada microelectromechanical, oo ay ka mid yihiin tungsten silicide inta badan loo isticmaalo filim khafiif ah oo lagu soo saaro microcircuits.Ujeedadaas awgeed, filimka tungsten silicide wuxuu noqon karaa balasma-etched iyadoo la isticmaalayo, tusaale ahaan, silicide.

Qalab qani ah oo qani ah ayaa ku takhasusay Soo saarista Bartilmaameedka Sputtering waxayna soo saari karaan Tungsten Silicide Sputtering Materials iyadoo la raacayo qeexitaanka macaamiisha.Wixii macluumaad dheeraad ah, fadlan nala soo xiriir.