Hadda isticmaaleyaal aad iyo aad u badan ayaa fahmaya noocyada bartilmaameedyada iyocodsiyadeeda, laakiin qayb-hoosaadkeedu waxa laga yaabaa inaanay aad u caddayn.Hadda aynuInjineer RSM kula wadaagqaar ka mid ah induction ee bartilmaameedyada sputtering magnetron.
Bartilmaameedka: bartilmaameedka dahaarka birta, bartilmaameedka daahan alloy, bartilmaameedka dahaarka dhoobada dhoobada, bartilmaameedka dhoobada dhoobada, bartilmaameedka dhoobada dhoobada, bartilmaameedka dhoobada fluoride, bartilmaameedka dhoobada dhoobada, bartilmaameedka nitride dhoobada, bartilmaameedka dhoobada oksaydhka, bartilmaameedka dhoobada dhoobada selenide, bartilmaameedka dhoobada dhoobada bartilmaameedka, bartilmaameedka dhoobada dhoobada sulfide, bartilmaameedka dhoobada dhoobada ah, bartilmaameedyada kale ee dhoobada, Chromium doped silicon oxide target ceramic target (CR SiO), target indium fosphide target (INP), bartilmaameed arsenide (pbas), bartilmaameedka indium arsenide (InAs).
Tuuritaanka Magnetron guud ahaan waxa loo qaybiyaa laba nooc: sputtering DC iyo RF sputtering.Mabda'a qalabka wax lagu dhufto ee DC waa mid fudud, heerkeeduna sidoo kale waa dhakhso marka birta la daadiyo.RF sputtering si weyn ayaa loo isticmaalaa.Marka laga soo tago faafinta xogta dhaqdhaqaaqa, waxa ay sidoo kale faafin kartaa xogta aan shaqaynayn.Bartilmaameedka sputtering waxa kale oo loo isticmaali karaa xafid falcelineed si loo diyaariyo xogta isku dhafan sida oksaydhyada, nitrides iyo karbides.Haddii inta jeer ee RF uu kordho, waxay noqon doontaa mikrowave plasma sputtering.Waqtigan xaadirka ah, resonance electron cyclotron (ECR) mikrowave balasmaha sputtering ayaa caadi ahaan loo isticmaalaa.
Waqtiga boostada: Meey-26-2022